Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning
- Author(s):
Okoroanyanwu, U. ( Advanced Micro Devices, Inc. (USA) and IMEC (Belgium) ) Stepanenko, N. ( Infineon Technologies AG (Germany) and IMEC (Belgium) ) Vereecke, G. ( IMEC (Belgium) ) Eliat, A. ( IMEC (Belgium) ) Kocsis, M.K. ( IMEC (Belgium) and Intel Corp. (USA) ) Kang, Y.S. ( IMEC (Belgium) and Samsung Electronics (South Korea) ) Jonckheere, R.M. ( IMEC (Belgium) ) Conard, T. ( IMEC (Belgium) ) Ronse, K.G. ( IMEC (Belgium) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 487
- Page(to):
- 503
- Pages:
- 17
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.1
- Type:
- Conference Proceedings
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