Study of air-bubble-induced light scattering effect on image quality in 193-nm immersion lithography

Study of air-bubble-induced light scattering effect on image quality in 193-nm immersion lithography

Author(s):

Fan, Y. ( Rochester Institute of Technology (USA) )
Lafferty, N.V. ( Rochester Institute of Technology (USA) )
Bourov, A. ( Rochester Institute of Technology (USA) )
Zavyalova, L.V. ( Rochester Institute of Technology (USA) )
Smith, B.W. ( Rochester Institute of Technology (USA) )

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

477

Page(to):

486

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013727
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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