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Scattering in liquid immersion lithography

Author(s):
Switkes, M. ( MIT Lincoln Lab. (USA) )
Bloomstein, T.M. ( MIT Lincoln Lab. (USA) )
Kunz, R.R. ( MIT Lincoln Lab. (USA) )
Rothschild, M. ( MIT Lincoln Lab. (USA) )
Ruberti, J.W. ( Cambridge Polymer Group, Inc. (USA) )
Shedd, T.A. ( Univ. of Wisconsin/Madison (USA) )
Yeung, M.S. ( Boston Univ. (USA) )
2 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
469
Page(to):
476
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

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