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Deep-UV immersion interferometric lithography

Author(s):
Raub, A.K. ( Univ. of New Mexico (USA) )
Frauenglass, A. ( Univ. of New Mexico (USA) )
Brueck, S.R.J. ( Univ. of New Mexico (USA) )
Conley, W. ( Motorola (USA) )
Dammel, R.R. ( Clariant Corp. (USA) )
Romano, A. ( Clariant Corp. (USA) )
Sato, M. ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
Hinsberg, W. ( IBM Almaden Research Ctr. (USA) )
3 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
306
Page(to):
318
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

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