Study of OPC for AAPSM reticles using various mask fabrication techniques
- Author(s):
Hughes, G.P. ( DuPont Photomasks, Inc. (USA) ) Kamaruddin, D. ( Motorola (USA) ) Nakagawa, K.H. ( DuPont Photomask, Inc. (USA) ) MacDonald, S. ( DuPont Photomask, Inc. (USA) ) Wilkinson, B. ( Motorola (USA) ) West, C. ( DuPont Photomasks, Inc. (USA) ) Park, K. ( DuPont Photomasks, Inc. (USA) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 204
- Page(to):
- 211
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.1
- Type:
- Conference Proceedings
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