New paradigm in lens metrology for lithographic scanner: evaluation and exploration

New paradigm in lens metrology for lithographic scanner: evaluation and exploration

Author(s):

Lai, K. ( IBM Microelectronics Div. (USA) )

Gallatin, G.M. ( IBM Microelectronics Div. (USA) )

van de Kerkhof, M.A. ( ASML (Netherlands) )

Boeij, Wim de ( ASML (Netherlands) )

Kok, H. ( ASML (Netherlands) )

Schriever, M. ( Carl Zeiss (Germany) )

Morillo, J.D. ( IBM Microelectronics Div. (USA) )

Fair, R.H. ( IBM Microelectronics Div. (USA) )

Bennett, S. ( ASML (Netherlands) )

Corliss, D.A. ( IBM Microelectronics Div. (USA) )

5 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

160

Page(to):

171

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013727
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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