Understanding the role of base quenchers in photoresists
- Author(s):
Michaelson, T.B. ( Univ. Texas/Austin (USA) ) jamieson, A.T. ( Univ. Texas/Austin (USA) ) Pawloski, A.R. ( Advanced MicroDevices, Inc. (USA) ) Byers, J.D. ( KLA-Tencor Corp. (USA) ) Acheta, A. ( Advanced MicroDevices, Inc. (USA) ) Willson, C.G. ( Univ. Texas/Austin (USA) ) - Publication title:
- Advances in Resist Technology and Processing XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5376
- Pub. Year:
- 2004
- Page(from):
- 1282
- Page(to):
- 1294
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- Language:
- English
- Call no.:
- P63600/5376.2
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Improving the performance of 193-nm photoresists based on alicyclic polymers
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Characterization of line-edge roughness in photoresist using an image fading technique
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Positive- and negative-tone water-processable photoresists: a progress report
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |