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Effect of PEB exhaust on resist CD for DUV process

Author(s):
  • Tsai, S.-F. ( Vanguard International Semiconductor Corp. (Taiwan) )
  • Chiu, Y.-S. ( Vanguard International Semiconductor Corp. (Taiwan) )
  • Chien, C.-H. ( Vanguard International Semiconductor Corp. (Taiwan) )
  • Gao, H.-Y. ( Vanguard International Semiconductor Corp. (Taiwan) )
  • Ku, C.-Y. ( Vanguard International Semiconductor Corp. (Taiwan) )
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
1157
Page(to):
1164
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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