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Microlens-induced pattern defect in DUV resist

Author(s):
Tsai, S.-F. ( Vanguard International Semiconductor Corp. (Taiwan) )
Chen, C.-Y. ( Vanguard International Semiconductor Corp. (Taiwan) )
Chang, C.-C. ( Vanguard International Semiconductor Corp. (Taiwan) )
Huang, T.-W. ( Vanguard International Semiconductor Corp. (Taiwan) )
Gao, H.-Y. ( Vanguard International Semiconductor Corp. (Taiwan) )
Ku, C.-Y. ( Vanguard International Semiconductor Corp. (Taiwan) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
1149
Page(to):
1156
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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