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New materials for 193-nm trilayer imaging

Author(s):
Meador, J.D. ( Brewer Science, Inc. (USA) )
Holmes, D. ( Brewer Science, Inc. (USA) )
Nagatkina, M.I. ( Brewer Science, Inc. (USA) )
Puligadda, R. ( Brewer Science, Inc. (USA) )
Gum, D. ( Brewer Science, Inc. (USA) )
Bennett, R. ( Brewer Science, Inc. (USA) )
Sun, S.X. ( Brewer Science, Inc. (USA) )
Enomoto, T. ( Nissan Chemical Industries, Ltd. (Japan) )
3 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
1138
Page(to):
1148
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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