PEB sensitivity studies of ArF resists: II. Polymer and solvent effects
- Author(s):
Hong, C.-S. ( Clariant Corp. (USA) ) Lee, S.-H. ( Clariant Corp. (USA) ) Kim, W.-K. ( Clariant Corp. (USA) ) Kudo, T. ( Clariant Corp. (USA) ) Timko, A. ( Clariant Corp. (USA) ) Mckenzie, D. ( Clariant Corp. (USA) ) Anyadiegwu, C. ( Clariant Corp. (USA) ) Rahman, D.M. ( Clariant Corp. (USA) ) Lin, G. ( Clariant Corp. (USA) ) Dammel, R.R. ( Clariant Corp. (USA) ) Padmanaban, M. ( Clariant Corp. (USA) ) - Publication title:
- Advances in Resist Technology and Processing XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5376
- Pub. Year:
- 2004
- Page(from):
- 1131
- Page(to):
- 1137
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- Language:
- English
- Call no.:
- P63600/5376.2
- Type:
- Conference Proceedings
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