Influence of backbone chemistry on the post-exposure bake temperature sensitivity of 193-nm photoresists

Influence of backbone chemistry on the post-exposure bake temperature sensitivity of 193-nm photoresists

Author(s):

Bae, Y.C. ( Rohm and Haas Electronic Materials (USA) )

Ogawa, T. ( Rohm and Haas Electronic Materials (USA) )

Kavanagh, R.J. ( Rohm and Haas Electronic Materials (USA) )

Kobayashi, T. ( Rohm and Haas Electronic Materials (USA) )

Lindsay, T. ( Rohm and Haas Electronic Materials (USA) )

Tanaka, T. ( Rohm and Haas Electronic Materials (USA) )

Xu, C.B. ( Rohm and Haas Electronic Materials (USA) )

Orsula, G. ( Rohm and Haas Electronic Materials (USA) )

DeSisto, J. ( Rohm and Haas Electronic Materials (USA) )

Hellion, M. ( Rohm and Haas Electronic Materials (USA) )

5 more

Publication title:

Advances in Resist Technology and Processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

1123

Page(to):

1130

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013726
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

Similar Items:

1 Conference Proceedings Mechanistic understanding of post-etch roughness in 193-nm photoresists Bae, Y.C., Barclay, G.G., Bolton, P.J., Kavanagh, R.J., Bu, L., Kobayashi, T., Adams, T., Pugliano, N., Thackeray, J.W. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Implications of immersion lithography on 193-nm photoresists Taylor, J.C., Chambers, C.R., Deschner, R., LeSuer, R.J., Conley, W.E., Burns, S.D., Willson, C.G. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Methods to achieve sub-100-nm contact hole lithography Lindsay, T.K., Kavanagh, R.J., Pohlers, G., Kanno, T., Bae, Y.C., Barclay, G.G., Kanagasabapathy, S., Mattia, J. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Double exposure using 193nm negative tone photoresist R. Kim, T. Wallow, J. Kye, H. J. Levinson, D. White SPIE - The International Society of Optical Engineering
3 Conference Proceedings Critical dimension sensitivity to post-exposure bake temperature variations in EUV photoresists SPIE - The International Society of Optical Engineering	9 Conference Proceedings Thick-film positive DUV photoresist for implant layer application Mori,M., Thackeray,J.W., Xu,C.B., Orsula,G.W., Prettyman,E., Bell,R., Routh,R.M. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone Tanaka,T., Choi,S.-J., Jung,D.-W., Lee,S., Lee,S.-H., Kang,Y., Woo,S.-G., Moon,J.-T., Kavanagh,R.J., Barclay,G.G., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Practical resists for 193-nm lithography using 2.38% TMAH:physicochemical influences on resist performance Szmanda,C.R., Yu,J., Barclay,G.G., Cameron,J.F., Kavanagh,R.J., Blacksmith,R.F., III,P.Trefonas, Taylor,G.N. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers Kavanagh, R.J., Orsula, G.W., Hellion, M., Barclay, G.G., Caporale, S., Pugliano, N., Thackeray, J.W., Mortini, B.P. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Molecular weight tailoring in methacrylate 193-nm photoresists Wallow, T. I., Brock, P. J., Truong, H., Allen, R. D., Opitz, J., Hofer, D. C. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Effect of scattering bar assist features in 193-nm lithography Joesten, L.A., Reilly, M.T., DeSisto, J., Jehoul, C. SPIE-The International Society for Optical Engineering	12 Conference Proceedings High-performance 193nm photoresists based on fluorosulfonamide W. Li, K. Chen, R. Kwong, M. C. Lawson, M. Khojasteh, I. Popova, P. R. Varanasi, T. Shimokawa, Y. Yamaguchi, S. … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12