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Effect of photoacid generator additives on the dissolution behavior of bis-trifluoromethyl carbinol substituted polynorbornene

Author(s):
Hoskins, T. ( Georgia Institute of Technology (USA) )
Berger, C.M. ( Georgia Institute of Technology (USA) )
Ludovice, P.J. ( Georgia Institute of Technology (USA) )
Henderson, C.L. ( Georgia Institute of Technology (USA) )
Seger, L.D. ( Promerus LLC (USA) )
Chang, C. ( Promerus LLC (USA) )
Rhodes, L.F. ( Promerus LLC (USA) )
2 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
1053
Page(to):
1063
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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