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Do we need complex resist models for predictive simulation of lithographic process performance?

Author(s):
  • Tollkuhn, B. ( Fraunhofer-Institut fur Integrierte Systeme und Bauelementetechnologie (Germany) )
  • Erdmann, A. ( Fraunhofer-Institut fyr Integrierte Systeme und Bauelementetechnologie (Germany) )
  • Lammers, J. ( Philips Research Leuven (Belgium) )
  • Nolscher, C. ( Infineon Technologies AG (Germany) )
  • Semmler, A. ( Infineon Technologies AG (Germany) )
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
983
Page(to):
994
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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