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Simulation technique for the PR flow process using a new viscous flow model

Author(s):
Chung, W.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, T.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, J.-Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, H.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, Y.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Kong, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
975
Page(to):
982
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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