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Surface conditioning solutions to reduce resist line roughness

Author(s):
Zhang, P. ( Air Products and Chemicals, Inc. (USA) )
Jaramillo, M., Jr. ( Air Products and Chemicals, Inc. (USA) )
Rao, M.B. ( Air Products and Chemicals, Inc. (USA) )
Yates, C. ( LSI Logic Corp. (USA) )
King, D.M. ( Air Products and Chemicals, Inc. (USA) )
Ross, B.F. ( Air Products and Chemicals, Inc. (USA) )
O'Brien, B.L. ( Air Products and Chemicals, Inc. (USA) )
2 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
801
Page(to):
806
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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