Explanation of LER using the concept of gel layer in chemically amplified photoresists
- Author(s):
- Cho, J.Y. ( DongbuAnam Semiconductor (South Korea) )
- Choi, S.J. ( Seoul National Univ. (South Korea) )
- Choi, Y.J. ( DongbuAnam Semiconductor (South Korea) )
- Kim, H.L. ( DongbuAnam Semiconductor (South Korea) )
- Kim, K.H. ( DongbuAnam Semiconductor (South Korea) )
- Publication title:
- Advances in Resist Technology and Processing XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5376
- Pub. Year:
- 2004
- Page(from):
- 782
- Page(to):
- 789
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- Language:
- English
- Call no.:
- P63600/5376.2
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Influence of activation energy on LER in chemically amplified KrF photoresists
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Quantitative description of phenolic polymer dissolution using the concept of gel layer
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Quantitative description of phenolic polymer dissolution using the concept of gel layer: II. Base cation size effect
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] …
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Integrated system approach at GIST/ADEMRC for monitoring atmospheric environment
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes)containing acetal groups
SPIE-The International Society for Optical Engineering |
Trans Tech Publications |
12
Conference Proceedings
Chemically amplified deep UV resists for electron-beam lithography applications
SPIE-The International Society for Optical Engineering |