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Material origins of line-edge roughness: Monte Carlo simulations and scaling analysis

Author(s):
  • Patsis, G.P. ( Institute of Microelectronics, NCSR Demokritos (Greece) )
  • Constantoudis, V. ( Institute of Microelectronics, NCSR Demokritos (Greece) )
  • Gogolides, E. ( Institute of Microelectronics, NCSR Demokritos (Greece) )
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
773
Page(to):
781
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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