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Sources of line-width roughness for EUV resists

Author(s):
Cao, H.B. ( Intel Corp. (USA) )
Yueh, W. ( Intel Corp. (USA) )
Rice, B.J. ( Intel Corp. (USA) )
Roberts, J. ( Intel Corp. (USA) )
Bacuita, T. ( Intel Corp. (USA) )
Chandhok, M. ( Intel Corp. (USA) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
757
Page(to):
764
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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