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Application of new thin BARC technology for KrF lithography at 80-nm node device

Author(s):
Kim, M.-S. ( Hynix Semiconductor Inc. (South Korea) )
Shim, K.-C. ( Hynix Semiconductor Inc. (South Korea) )
Kim, H.-J. ( Hynix Semiconductor Inc. (South Korea) )
Kwon, K.-S. ( Hynix Semiconductor Inc. (South Korea) )
Lee, H.-G. ( Hynix Semiconductor Inc. (South Korea) )
Lee, C.-S. ( Hynix Semiconductor Inc. (South Korea) )
Gil, M.-G. ( Hynix Semiconductor Inc. (South Korea) )
Song, Y.-W. ( Hynix Semiconductor Inc. (South Korea) )
3 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
724
Page(to):
728
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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