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Integration using inorganic BARC in a via-first dual-damascene process with low-k dielectric

Author(s):
Ahn, J.K. ( Hynix Semiconductor Inc. (South Korea) )
Choi, S.H. ( Hynix Semiconductor Inc. (South Korea) )
Kim, Y.K. ( Hynix Semiconductor Inc. (South Korea) )
Park, K.Y. ( Hynix Semiconductor Inc. (South Korea) )
Choi, J.S. ( Hynix Semiconductor Inc. (South Korea) )
Hong, E.S. ( Hynix Semiconductor Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
Kim, S.B. ( Hynix Semiconductor Inc. (South Korea) )
Choi, K.K. ( Hynix Semiconductor Inc. (South Korea) )
Hwang, S.B. ( Hynix Semiconductor Inc. (South Korea) )
Lee, J.G. ( Hynix Semiconductor Inc. (South Korea) )
6 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
673
Page(to):
683
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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