Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
- Author(s):
Kim, J.-W. ( Dongjin Semichem Co., Ltd. (South Korea) ) Son, E.-K. ( Dongjin Semichem Co., Ltd. (South Korea) ) Lee, S.-H. ( Dongjin Semichem Co., Ltd. (USA) ) Kim, D. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) ) Lee, G. ( Hynix Semiconductor Inc. (South Korea) ) Jung, J.C. ( Hynix Semiconductor Inc. (USA) ) Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) ) Moon, S.C. ( Hynix Semiconductor Inc. (USA) ) Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Advances in Resist Technology and Processing XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5376
- Pub. Year:
- 2004
- Page(from):
- 599
- Page(to):
- 607
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- Language:
- English
- Call no.:
- P63600/5376.1
- Type:
- Conference Proceedings
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