BIORESIST: a lithographic approach for the patterning of cells in tissue engineering applications

BIORESIST: a lithographic approach for the patterning of cells in tissue engineering applications

Author(s):

He, W. ( Univ. of Connecticut (USA) )
Gonsalves, K.E. ( Univ. of North Carolina/Charlotte (USA) )
Halberstadt, C.R. ( Carolinas Medical Ctr. (USA) )
Umar, Y. ( Univ. of North Carolina/Charlotte (USA) )
Choi, J.-H. ( Univ. of North Carolina/Charlotte (USA) )

Publication title:

Advances in Resist Technology and Processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

502

Page(to):

507

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

Similar Items:

1 Conference Proceedings Patterning of Cells on Bioresist for Tissue Engineering Applications Umar, Yusif, Thiyagarajan, Muthiah, Halberstadt, Craig, Gonsalves, K. E. Materials Research Society	7 Conference Proceedings Novel CA resists with photoacid generator in polymer chain Wu,H., Gonsalves,K.E. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Nanometric Surface Patterns for Tissue Engineering: Fabrication and Biocompatibility In Vitro Riehle, M., Dalby, M., Johnstone, H., Gallagher, J., Wood, M.A., Casey, B., McGhee, K., Affrossman, S., Wilkinson, … Materials Research Society	8 Conference Proceedings Lithographic characterization of improved projection optics in the EUVL engineering test stand O'Connell, D.J., Lee, S.H., Ballard, W.P., Tichenor, D.A., II, L.J.B., Haney, S.J., Johnson, T.A., Barr, P.K., Leung, … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Diffusivity measurements in polymers:I.Lithographic modeling results Mack,C.A., Mueller,K.E., Gardiner,A.B., Qin,A., Dammel,R.R., Koros,W.J., Willson,C.G. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Cell-by-Cell Construction of Living Tissue Ringeisen, Bradley R., Kim, Heungsoo, Young, H. Daniel, Spargo, Barry J., Auyeung, R.C.Y., Pique, Alberto, Chrisey, … Materials Research Society
4 Conference Proceedings Lithographic evaluation of the EUV engineering test stand Lee, S.H., Tichenor, D.A., Ballard, W.P., Bernardez, L.J, II., Goldsmith, J.E.M., Haney, S.J., Jefferson, K.L., Johnson, … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Applications of photorefractive polymer to pattern recognition Joo, W.-J., Choi, C.-S., Moon, I.K., Kim, N. SPIE-The International Society for Optical Engineering
5 Conference Proceedings New advances in resist system for next-generation lithography Hu,Y., He,W., Gonsalves,K.E., Merhari,L. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs Choi,S.-J., Choi,Y.-J., Kim,Y.-S., Kim,S.-D., Kim,D.-B., Kim,J.-H., Koh,C.-W., Lee,G., Jung,J.-C., Baik,K.-H. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Laser-tissue photothermal interaction and tissue temperature change Ives,A.K., Chen,W.R., Jassemnejad,B., Bartels,K.E., Liu,H., Nordquist,J.A., Nordquist,R.E. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Marathon testing of optical materials for 193-nm lithographic applications Liberman,V., Rothschild,M., Sedlacek,J.H., Uttaro,R.S., Bates,A.K., Peski,C.K.Van SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12