Blank Cover Image

Evaluation of wet-developable KrF organic BARC to improve CD uniformity for implant application

Author(s):
Guilmeau, I.D. ( CEA-LETI (France) )
Guerrero, A.F. ( Brewer Science, Inc. (USA) )
Blain, V. ( Brewer Science, Inc. (USA) )
Kremer, S. ( KLA-Tencor France (France) )
Vachellerie, V. ( STMicroelectronics (France) )
Lenoble, D. ( STMicroelectronics (France) )
Nogueira, P. ( STMicroelectronics (France) )
Mougel, S. ( STMicroelectronics (France) )
Chapon, J.-D. ( STMicroelectronics (France) )
4 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
461
Page(to):
470
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Developer soluble organic BARCs for KrF lithography

Cox, C., Dippel, D.F., Ghelli, C.L., Valerio, P., Simmons, W.J., Guerrero, A.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Organic BARC process evaluation for via first dual-damascene patterning

Tan,C.-H., Mukherjee-Roy,M., Jo,W.-M., Kumar,R., Foo,P.-D., Sathappan,S., Ngooi,S.-W.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Application of photosensitive BARC and KrF resist on implant layers

Owe-Yang, D.C., Ho, B.-, Miyazaki, S., Katayama, T., Susukida, K., Kang, W., Chang, Y.-C.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Improving lithography intra wafer CD for C045 implant layers using STI thickness feed forward?

J. Massin, B. Orlando, M. Gatefait, J.-D. Chapon, B. Le-Gratiet

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Improving global CD uniformity by optimizing post-exposure bake and develop sequences

Osborne, S.P., Mueller, M., Lem, H., Reyland, D., Baik, K.H.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Impact of synchoronization errors on overlay and CD control

Luce, E., Mougel, S., Goirand, P.-J., Depre, J.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Resist component leaching in 193-nm immersion lithography

Chapon, J.-D., Chaton, C., Gouraud, P., Broekaart, M., Warrick, S., Guilmeau, I., Trauiller, Y., Belledent, J.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Development of 193-nm wet BARCs for implant applications [6153-100]

Meador, J., Beaman, C., Lowes, J., Washburn, C., Mercado, R., Nagatkina, M., Stroud, C.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Comparison between organic spin-on BARC and carbon-containing CVD stack for 65-nm gate patterning

Jean-Damien Chapon, Catherine Chaton, Pascal Gouraud, Marcel Broekaart, Scott Warrick, Isabelle Guilmeau, Yorick …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Comparative evaluation of GdCOB and YCOB nonlinear optical properties in principal-and out-of-principal-plane configurations for 1064-nm Nd:YAG laser frequency …

Aka,G., Mougel,F., Pelenc,D., Ferrand,B., Vtvlen,D.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings A novel 248-nm wet-developable BARC for trench applications

C. J. Neef, D. Thomas

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Characterization and improvement of field CD uniformity for implementation of 0.15-μm technology device using KrF stepper

Hyun, Y.-S., Kim, D.-J., Koh, C.-W., Park, S.-N., Kwon, W.-T.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12