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Patterning capabilities of EUV resists

Author(s):
Yueh, W. ( Intel Corp. (USA) )
Cao, H.B. ( Intel Corp. (USA) )
Chandhok, M. ( Intel Corp. (USA) )
Lee, S. ( Intel Corp. (USA) )
Shumway, M. ( Univ. of California/Berkeley (USA) )
Bokor, J. ( Univ. of California/Berkeley (USA) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
434
Page(to):
442
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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