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Resolution limitations in chemically amplified photoresist systems

Author(s):
Schmid, G.M. ( Univ. of Texas/Austin (USA) )
Stewart, M.D. ( Univ. of Texas/Austin (USA) )
Wang, C.-Y. ( National Institute of Standards and Technology (USA) )
Vogt, B.D. ( National Institute of Standards and Technology (USA) )
Prabhu, V.M. ( National Institute of Standards and Technology (USA) )
Lin, E.K. ( National Institute of Standards and Technology (USA) )
Willson, C.G. ( Univ. of Texas/Austin (USA) )
2 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
333
Page(to):
342
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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