Surface and bulk chemistry of chemically amplified photoresists: segregation in thin films and environmental stability issues

Surface and bulk chemistry of chemically amplified photoresists: segregation in thin films and environmental stability issues

Author(s):

Jablonski, E.L. ( National Institute of Standards and Technology (USA) )

Prabhu, V.M. ( National Institute of Standards and Technology (USA) )

Sambasivan, S. ( National Institute of Standards and Technology (USA) )

Fischer, D.A. ( National Institute of Standards and Technology (USA) )

Lin, E.K. ( National Institute of Standards and Technology (USA) )

Goldfarb, D.L. ( IBM Thomas J. Watson Research Ctr. (USA) )

Angelopoulos, M. ( IBM Thomas J. Watson Research Ctr. (USA) )

Ito, H. ( IBM Almaden Research Ctr. (USA) )

3 more

Publication title:

Advances in Resist Technology and Processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

302

Page(to):

311

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

Similar Items:

1 Conference Proceedings Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists Prabhu, V.M., Wang, M.X., Jablonski, E.L., Vogt, B.D., Lin, E.K., Wu, W.-L., Goldfarb, D.L., Angelopoulos, M., Ito, H. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Correlation of the Reaction Front with Roughness in Chemically Amplified Photoresists Jones, Ronald L., Prabhu, Vivek M., Goldfarb, Dario L., Lin, Eric K., Soles, Christopher L., Lenhart, Joseph L., Wu, … American Chemical Society
2 Conference Proceedings X-ray absorption spectroscopy to probe interfacial issues in photolithography Lenhart, J.L., Fischer, D.A., Sambasivan, S., Lin, E.K., Jones, R.L., Soles, C.L., Wu, W., Goldfarb, D.L., Angelopoulos, … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Resolution limitations in chemically amplified photoresist systems Schmid, G.M., Stewart, M.D., Wang, C.-Y., Vogt, B.D., Prabhu, V.M., Lin, E.K., Willson, C.G. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Polymer dynamics and diffusive properties in ultrathin photoresist films Soles, C.L., Jones, R.L., Lenhart, J.L., Prabhu, V.M., Wu, W., Lin, E.K., Goldfarb, D.L., Angelopoulos, M. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions Lin,Q., Goldfarb,D.L., Angelopoulos,M., Sriram,S.R., Moore,J.S. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Polyelectrolyte effects in model photoresist developer solutions: roles of base concentration and added salts Prabhu, V.M., Jones, R.L., Lin, E.K., Soles, C.L., Wu, W., Goldfarb, D.L., Angelopoulos, M. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Image collapse issues in photoresist Simons,J.P., Goldfarb,D.L., Angelopoulos,M., Messick,S., Moreau,W.M., Robinson,C., Pablo,J.J.de, Nealey,P.F. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Measurements of water distribution in thin lithographic films Vogt, B.D., Soles, C.L., Prabhu, V.M., Jones, R.L., Wu, W.-L., Lin, E.K., Goldfarb, D.L., Angelopoulos, M. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Characterization of thin and ultrathin polymer and resist films Goldfarb,D.L., Lin,Q., Angelopoulos,M., Soles,C.L., Lin,E.K., Wu,W.-L. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Deprotection volume characteristics and line-edge morphology in chemcially amplified resists Jones, R.L., Hu, T., Prabhu, V.M., Soles, C.L., Lin, E.K., Wu, W., Goldfarb, D.L., Angelopoulos, M., Trinque, B.C.], … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Utilizing Near Edge X-ray Absorption Fine Structure to Probe Interfacial Issues in Photolithography Lenhart, Joseph L., Fischer, Daniel A., Sambasivan, Sharadha, Lin, Eric K., Soles, Christopher L., Jones, Ronald L., Wu, … American Chemical Society

1

2

3

4

5

6

7

8

9

10

11

12