Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node
- Author(s):
- Wallace, C. ( Infineon Technologies AG (Germany) )
- Schacht, J. ( Infineon Technologies AG (Germany) )
- Huang, I.H. ( UMC (Taiwan) )
- Hsu, R.H. ( UMC (Taiwan) )
- Publication title:
- Advances in Resist Technology and Processing XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5376
- Pub. Year:
- 2004
- Page(from):
- 238
- Page(to):
- 244
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- Language:
- English
- Call no.:
- P63600/5376.1
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Double patterning combined with shrink technique to extend ArF lithography for contact holes to 22nm node and beyond
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Optimization of lithography process to improve image deformation of contact hole sub-90 nm technology node
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
90-nm lithography process characterization using ODP scatterometry technology
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Extension of ArF lithography for poly gate patterning of 65-nm generation and beyond
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |