Overbake: sub-40-nm gate patterning with ArF lithography and binary masks

Overbake: sub-40-nm gate patterning with ArF lithography and binary masks

Author(s):

Van Steenwinckel, D. ( Philips Research Leuven (Belgium) )
Kwinten, H. ( Philips Research Leuven (Belgium) )
Locorotondo, S. ( IMEC (Belgium) )
Beckx, S. ( IMEC (Belgium) )

Publication title:

Advances in Resist Technology and Processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

215

Page(to):

225

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

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