Recent advances in fluorinated resists for application at 157 nm

Recent advances in fluorinated resists for application at 157 nm

Author(s):

Houlihan, F.M. ( Clariant Corp. (USA) )

Sakamuri, R. ( Clariant Corp. (USA) )

Romano, A. ( Clariant Corp. (USA) )

Rentkiewicz, D. ( Clariant Corp. (USA) )

Dammel, R.R. ( Clariant Corp. (USA) )

Conley, W.E. ( International SEMATECH (USA) )

Miller, D.A. ( International SEMATECH (USA) )

Sebald, M. ( Infineon Technologies AG (Germany) )

Stepanenko, N. ( Infineon Technologies AG (Germany) )

Markert, M. ( Infineon Technologies AG (Germany) )

Mierau, U. ( Infineon Technologies AG (Germany) )

Vermeir, I. ( Infineon Technologies AG (Germany) )

Hohle, C. ( Infineon Technologies AG (Germany) )

Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Shigematsu, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kawaguchi, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

11 more

Publication title:

Advances in Resist Technology and Processing XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5376

Pub. Year:

2004

Page(from):

134

Page(to):

150

Pages:

17

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452894 [0819452890]

Language:

English

Call no.:

P63600/5376.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2004 : 21st
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.24

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