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Implications of immersion lithography on 193-nm photoresists

Author(s):
Taylor, J.C. ( Univ. of Texas/Austin (USA) )
Chambers, C.R. ( Univ. of Texas/Austin (USA) )
Deschner, R. ( Univ. of Texas/Austin (USA) )
LeSuer, R.J. ( Univ. of Texas/Austin (USA) )
Conley, W.E. ( Motorola, Inc. (USA) )
Burns, S.D. ( Univ. of Texas/Austin (USA) )
Willson, C.G. ( Univ. of Texas/Austin (USA) )
2 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
34
Page(to):
43
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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