Liquid immersion lithography: evaluation of resist issues
- Author(s):
Hinsberg, W. ( IBM Almaden Research Ctr. (USA) ) Wallraff, G.M. ( IBM Almaden Research Ctr. (USA) ) Larson, C.E. ( IBM Almaden Research Ctr. (USA) ) Davis, B.W. ( IBM Almaden Research Ctr. (USA) ) Deline, V. ( IBM Almaden Research Ctr. (USA) ) Raoux, S. ( IBM Almaden Research Ctr. (USA) ) Miller, D. ( IBM Almaden Research Ctr. (USA) ) Houle, F.A. ( IBM Almaden Research Ctr. (USA) ) Hoffnagle, J. ( IBM Almaden Research Ctr. (USA) ) Sanchez, M.I. ( IBM Almaden Research Ctr. (USA) ) Rettner, C. ( IBM Almaden Research Ctr. (USA) ) Sundberg, L.K. ( IBM Almaden Research Ctr. (USA) ) Medeiros, D.R. ( IBM Thomas J. Watson Research Ctr. (USA) ) Dammel, R.R. ( Clariant Corp. (USA) ) Conley, W.E. ( Motorola, Inc. (USA) ) - Publication title:
- Advances in Resist Technology and Processing XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5376
- Pub. Year:
- 2004
- Page(from):
- 21
- Page(to):
- 33
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- Language:
- English
- Call no.:
- P63600/5376.1
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
High numerical aperture: imaging implications for chemically amplified photoresists
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Extendibility of chemically amplified resists: another brick wall? (Invited Paper)
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Characterization of photoresist spatial resolution by interferometric lithography
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Real-time analysis of volatiles formed during processing of a chemically amplified resist
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Experimental method for quantifying acid diffusion in chemically amplified resists
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Using the critical ionization model for resist development to estimate contrast curves and roughening
SPIE-The International Society for Optical Engineering |
American Chemical Society |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |