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Contact hole application for lithography process development using the Opti-Probe three-dimensional RT/CD technology

Author(s):
Jiang, Z. ( Therma-Wave, Inc. (USA) )
Sorkhabi, O. ( Therma-Wave, Inc. (USA) )
Chu, H. ( Therma-Wave, Inc. (USA) )
Cao, X.L. ( Therma-Wave, Inc. (USA) )
Li, G. ( Therma-Wave, Inc. (USA) )
Wen, Y. ( Therma-Wave, Inc. (USA) )
Opsal, J.L. ( Therma-Wave, Inc. (USA) )
Chang, Y.-C. ( Univ. of Illinois/Urbana-Champaign (USA) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
1364
Page(to):
1373
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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