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Total test repeatability: a new figure of merit for CD metrology tools

Author(s):
Cramer, H. ( ASML (Netherlands) )
Kiers, T. ( ASML (Netherlands) )
Vanoppen, P. ( ASML (Netherlands) )
Meessen, J. ( ASML (Netherlands) )
Blok, F. ( ASML (Netherlands) )
Dusa, M.V. ( ASML (USA) )
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
1254
Page(to):
1264
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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