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Capability of spectroscopic ellipsometry-based profile metrology for detecting the profile excursion of polysilicon gate

Author(s):
Yeh, M. ( United Microelectronics Corp. (Taiwan) )
Fang, S.-P. ( United Microelectronics Corp. (Taiwan) )
Tsau, B.-J. ( United Microelectronics Corp. (Taiwan) )
Huang, C.-C. ( United Microelectronics Corp. (Taiwan) )
Lin, B.S. ( United Microelectronics Corp. (Taiwan) )
Fu, S. ( KLA-Tencor Corp. (USA) )
Chen, J.C. ( KLA-Tencor Corp. (USA) )
Freed, R. ( KLA-Tencor Corp. (USA) )
Dziura, T.G. ( KLA-Tencor Corp. (USA) )
Slessor, M.D. ( KLA-Tencor Corp. (USA) )
5 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
1135
Page(to):
1143
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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