Blank Cover Image

Characterization of integrated optical CD for process control

Author(s):
Yu, J. ( Timbre Technologies, Inc. (USA) )
Uchida, J. ( Timbre Technologies, Inc. (USA) )
van Dommelen, Y. ( ASML (Netherlands) )
Carpaij, R. ( ASML (Netherlands) )
Cheng, S. ( IMEC (Belgium) )
Pollentier, I. ( IMEC (Belgium) )
Viswanathan, A. ( Timbre Technologies, Inc. (USA) )
Lane, L. ( Timbre Technologies, Inc. (USA) )
Barry, K.A. ( Timbre Technologies, Inc. (USA) )
Jakatdar, N. ( Timbre Technologies, Inc. (USA) )
5 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
1059
Page(to):
1068
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings In-line lithography cluster monitoring and control using integrated scatterometry

Pollentier, I., Cheng, S.Y., Baudemprez, B., Laidler, D., van Dommelen, Y., Carpaij, R., Yu, J., Uchida, J., …

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Application of optical CD for characterization of 70nm dense lines

Akerman, L., Eytan, G., Uchida, R., Fujimura, S., Mimura, T.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Metrology exposure-induced resist and ARC damage

Yu, J., Viswanathan, A., Miyagi, M., Uchida, J., Lane, L., Barry, K.A., Kajitani, M., Kikuchi, T., Chan, K.C., Stanke, …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Implementation strategies and return on investment for integrated CD control

L. Lane, B. Monteverde

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Characterization of a positive chemically amplified photoresist for process control

Jakatdar,N.H., Niu,X., Spanos,C.J., Romano,A.R., Bendik,J.J., Kovacs,R.P., Hill,S.L.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Characterization and Related Studies Magneto-Optical Study of Interface Diffusion in CdTe/Cd1-xMnxTe Multiple Quantum Wells

Kuroda,S., Kojima,K., Kobayashi,K., Saito,A., Takita,K., Uchida,K., Miura,N.

Trans Tech Publications
4 Conference Proceedings Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Chen, L.-J., Ke, C.-M., Yu, S.S., Gau, T.-S., Chen, P., Ku, Y.-C., Lin, B.J., Engelhard, D., Hetzer, D., Yang, J.Y., …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Scatterometry for contact hole lithography

Barry, K.A., Viswanathan, A., Niu, X., Bischoff, J.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Line-edge roughness reduction and CD slimming using hardback processing

Peters, R.D., Lucas, K., Cobb, J.L., Parker, C., Patterson, K., McCauley, R., Ercken, M., Roey, F.V., Vandenbroeck, N., …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Advanced process control for hyper-NA lithography based on CD-SEM measurement

T. Ishimoto, K. Sekiguchi, N. Hasegawa, T. Maeda, K. Watanabe, G. Storms, D. Laidler, S. Cheng

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Etch, reticle, and track CD fingerprint corrections with local dose compensation

van der Laan, H., Carpaij, R., Krist, J., Noordman, O., van Dommelen, Y., van Schoot, J., Blok, F., van Os, C., …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Evaluation of i-line Nikon Stepper leveling methods for improved CD control

Barry, R., Thompson, J.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12