PSM alignment for Sigma7300: signal quality and resist effects from using the writing DUV laser light spatial light modulator and a CCD camera as measurement tool for 2:nd layer alignment metrology

PSM alignment for Sigma7300: signal quality and resist effects from using the writing DUV laser light spatial light modulator and a CCD camera as measurement tool for 2:nd layer alignment metrology

Author(s):

Ostrom, T. ( Micronic Laser Systems AB (Sweden) )
Lindau, S. ( Micronic Laser Systems AB (Sweden) )
Ekberg, M. ( Micronic Laser Systems AB (Sweden) )
Fosshaug, H.A. ( Micronic Laser Systems AB (Sweden) )
Zerne, R. ( Micronic Laser Systems AB (Sweden) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5375

Pub. Year:

2004

Page(from):

1039

Page(to):

1049

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

Language:

English

Call no.:

P63600/5375.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013724
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2004 : 18th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.26

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