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Effect of inline dose and focus monitoring and control on post-etch CD

Author(s):
Dinu, B.A. ( KLA-Tencor Corp. (USA) )
Subramony, V. ( TECH Semiconductor (Singapore) )
Lim, P.C. ( TECH Semiconductor (Singapore) )
Goh, D. ( TECH Semiconductor (Singapore) )
Eichelberger, B.J. ( KLA-Tencor Corp. (USA) )
Chew, K.B. ( KLA-Tencor Corp. (USA) )
Monahan, K.M. ( KLA-Tencor Corp. (USA) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
1004
Page(to):
1009
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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