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Test of a new sub-90-nm DR overlay mark for DRAM production

Author(s):
Gruss, S. ( Infineon Technologies AG (Germany) )
Teipel, A. ( Infineon Technologies AG (Germany) )
Fuelber, C. ( Infineon Technologies AG (Germany) )
Kassel, E. ( KLA-Tencor Corp. (Israel) )
Adel, M. ( KLA-Tencor Corp. (Israel) )
Ghinovker, M. ( KLA-Tencor Corp. (Israel) )
Izikson, P. ( KLA-Tencor Corp. (Israel) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
881
Page(to):
892
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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