Detection method for a T-topped profile in resist patterns by CD-SEM

Detection method for a T-topped profile in resist patterns by CD-SEM

Author(s):

Yamaguchi, A. ( Hitachi, Ltd. (Japan) )
Fukuda, H. ( Hitachi, Ltd. (Japan) )
Komuro, O. ( Hitachi High-Technologies Corp. (Japan) )
Yoneda, S. ( Hitachi High-Technologies Corp. (Japan) )
Iizumi, T. ( Hitachi High-Technologies Corp. (Japan) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5375

Pub. Year:

2004

Page(from):

874

Page(to):

880

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

Language:

English

Call no.:

P63600/5375.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013724
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2004 : 18th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.26

Similar Items:

1 Conference Proceedings Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance Yamaguchi, A., Tsuchiya, R., Fukuda, H., Komuro, O., Kawada, H., Iizumi, T. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Application of top-down CD-SEM metrology in measuring and correlating profile with CD data in resist films with various thickness and sidewall profiles Dixit,S.S., Azordegan,A.R., Liu,Y. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Zero-shrink dimension evaluated for ArF-resist patterns measured by CD-SEM Kawada, H., Iizumi, T., Otaka, T. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Fine pixel CD-SEM for measurements of two-dimensional patterns Yamaguchi, S., Itoh, M., Ikeda, T., Miyano, Y., Mitsui, T., Amma, M., Horikawa, S. SPIE - The International Society of Optical Engineering
3 Conference Proceedings New approach to the focus exposure matrix(FEM)sample measurement using CD-SEM Morokuma,H., Yamaguchi,S., Maeda,T., Iizumi,T., Ueda,K. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Characterizing cross-sectional profile variations by using multiple parameters extracted from top-down SEM images Shishido, C., Takagi, Y., Tanaka, M., Komuro, O., Morokuma, H., Sasada, K. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Bias-free measurement of LER/LWR with low damage by CD-SEM [6152-89] Yamaguchi, A., Steffen, R., Kawada, H., Iizumi, T. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Characterization of line-edge roughness in Cu/low-k interconnect pattern A. Yamaguchi, D. Ryuzaki, J. Yamamoto, H. Kawada, T. Iizumi SPIE - The International Society of Optical Engineering
5 Conference Proceedings Novel CD-SEM calibration reference consisting of 100-nm pitch grating and positional identification mark Y. Nakayama, H. Kawada, S. Yoneda, T. Mizuno SPIE - The International Society of Optical Engineering	11 Conference Proceedings Effect of various ArF resist shrinkage amplitudes on CD bias Ke, C.-M., Gau, T.-S., Chen, P.-H., Yen, A., Lin, B.J., Otaka, T., Iizumi, T., Sasada, K., Ueda, K. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Metrology of LER: influence of line-edge roughness (LER) on transistor performance Yamaguchi, A., Ichinose, K., Shimamoto, S., Fukuda, H., Tsuchiya, R., Ohnishi, K., Kawada, H., Iizumi, T. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Cross-sectional gate feature identification method using top-down SEM images (Invited Paper) Tanaka, M., Shishido, C., Takagi, Y., Morokuma, H., Komuro, O., Mori, H. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12