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Overlay advanced process control for foundry application

Author(s):
Wan, X. ( Semiconductor Manufacturing International Corp. (China) )
Zhou, A. ( Semiconductor Manufacturing International Corp. (China) )
Zhang, F. ( Semiconductor Manufacturing International Corp. (China) )
Li, J. ( Semiconductor Manufacturing International Corp. (China) )
Gu, X. ( Semiconductor Manufacturing International Corp. (China) )
Mos, E.C. ( ASML (Netherlands) )
Kisteman, A. ( ASML (Netherlands) )
Wang, V. ( ASML (Netherlands) )
Schuurhuis, R. ( ASML (Netherlands) )
4 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
735
Page(to):
743
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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