Damage-free metrology of porous low-k dielectrics using CD-SEM

Damage-free metrology of porous low-k dielectrics using CD-SEM

Author(s):

Cheng, Z.-H. ( Hitachi, Ltd. (Japan) )
Nozoe, M. ( Hitachi, Ltd. (Japan) )
Ezumi, M. ( Hitachi High-Technologies Corp. (Japan) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5375

Pub. Year:

2004

Page(from):

665

Page(to):

674

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

Language:

English

Call no.:

P63600/5375.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013723
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2004 : 18th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.26

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