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Experimental methodology of contact edge roughness on sub-100-nm pattern

Author(s):
Lee, T.Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Ihm, D. ( Samsung Electronics Co., Ltd. (South Korea) )
Kang, H.C. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.B. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, B.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Chin, S.-B. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, Y.H. ( Applied Materials (Israel) )
Yang, H.D. ( Applied Materials (South Korea) )
Yang, K.M. ( Applied Materials (South Korea) )
5 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
623
Page(to):
632
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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