Experimental methodology of contact edge roughness on sub-100-nm pattern
- Author(s):
Lee, T.Y. ( Samsung Electronics Co., Ltd. (South Korea) ) Ihm, D. ( Samsung Electronics Co., Ltd. (South Korea) ) Kang, H.C. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, J.B. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, B.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Chin, S.-B. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, Y.H. ( Applied Materials (Israel) ) Yang, H.D. ( Applied Materials (South Korea) ) Yang, K.M. ( Applied Materials (South Korea) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 623
- Page(to):
- 632
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.1
- Type:
- Conference Proceedings
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