90-nm lithography process characterization using ODP scatterometry technology
- Author(s):
Ke, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Yu, S.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Wang, Y.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chou, Y.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chen, J.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lee, B.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chu, H.-Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, H.-T. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, C.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Ku, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Huang, J. ( Timbre Technologies, Inc. (USA) ) Hsu, J.J. ( Timbre Technologies, Inc. (USA) ) Liu, V. ( Timbre Technologies, Inc. (USA) ) Hetzer, D. ( Timbre Technologies, Inc. (USA) ) Yap, L. ( Timbre Technologies, Inc. (USA) ) Yang, W. ( Timbre Technologies, Inc. (USA) ) Araki, K. ( Tokyo Electron, Ltd. (Japan) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 597
- Page(to):
- 604
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.1
- Type:
- Conference Proceedings
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