Blank Cover Image

Spectroscopic ellipsometry-based scatterometry for depth and linewidth measurements of polysilicon-filled deep trenches

Author(s):
Hingst, T. ( Infineon Technologies AG (Germany) )
Moert, M. ( Infineon Technologies AG (Germany) )
Reinig, P. ( Infineon Technologies AG (Germany) )
Backen, E. ( Infineon Technologies AG (Germany) )
Dost, R. ( Infineon Technologies AG (Germany) )
Weidner, P. ( Infineon Technologies AG (Germany) )
Hopkins, J. ( KLA-Tencor Corp. (USA) )
Dziura, T.G. ( KLA-Tencor Corp. (USA) )
Elazami, A. ( KLA-Tencor Corp. (USA) )
Freed, R. ( KLA-Tencor Corp. (USA) )
5 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
587
Page(to):
596
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Spectroscopic Ellipsometry based Scatterometry enabling 193nm Litho and Etch process control for the 110nm technology node and beyond

Hingst, T., Marschner, T., Moert, M., Homilius, J., Guevremont, M., Hopkins, J., Elazami, A.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Spectroscopic CD metrology for sub-100-nm lithography process control

Mieher, W.D., Dziura, T.G., Chen, X., DeCecco, P., Levy, A.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Capability of spectroscopic ellipsometry-based profile metrology for detecting the profile excursion of polysilicon gate

Yeh, M., Fang, S.-P., Tsau, B.-J., Huang, C.-C., Lin, B.S., Fu, S., Chen, J.C., Freed, R., Dziura, T.G., Slessor, M.D.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Application of spectroscopic ellipsometry-based scatterometry for ultrathin spacer structure

Chen, R.C.-J., Chen, F.-C., Luo, Y.-Y., Perng, B.-C., Chiu, Y.-H., Tao, H.-J.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Scatterometry from crossed grating structures in different configurations

T. Schuster, S. Rafler, W. Osten, P. Reinig, T. Hingst

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Application of optical CD metrology based on both spectroscopic ellipsometry and scatterometry for Si-recess monitor [6152-17]

Huang, P. C. Y., Chen, R. C. J., Chen, F. C., Perng, B. C., Shieh, J. H., Jang, S. M., Liang, M. S.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Model-free and model-based methods for dimensional metrology during the lifetime of a product

P. Weidner, A. Kasic, T. Hingst, C. Ehlers, S. Philipp

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Production control of shallow trench isolation (STI) at the 130-nm node using spectroscopic ellipsometry-based profile metrology

Peters, R.M., Chiao, R.H., Eckert, T., Labra, R., Nappa, D., Tang, S., Washington, J.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system

Lin, W., Liao, S., Tsai, R., Yeh, M., Hsieh, C., Yu, Y., Lin, B. S., Fu, S., Dziura, T. G.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Deep discrete trenches filled by in-situ doped polysilicon:an alternative method for junction insulating box

Pierre,F., Aachboun,S., Bonnaud,O., Lhermite,H., Ranson,P., Anceau,Ch., Cornibert,L.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Measurement of high-k and metal film thickness on FinFET sidewalls using scatterometry

T. G. Dziura, B. Bunday, C. Smith, M. M. Hussain, R. Harris

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings A Comparison of Infrared Reflectance Spectroscopy and Spectroscopic Ellipsometry for Polysilicon Film Process Control

Carpio, R., Fowler, B., Simmons, D.G., Liu, S., Solomon, P.R.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12