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Metrology of LER: influence of line-edge roughness (LER) on transistor performance

Author(s):
Yamaguchi, A. ( Hitachi, Ltd. (Japan) )
Ichinose, K. ( Hitachi, Ltd. (Japan) )
Shimamoto, S. ( Hitachi, Ltd. (Japan) )
Fukuda, H. ( Hitachi, Ltd. (Japan) )
Tsuchiya, R. ( Hitachi, Ltd. (Japan) )
Ohnishi, K. ( Hitachi, Ltd. (Japan) )
Kawada, H. ( Hitachi High-Technologies Corp. (Japan) )
Iizumi, T. ( Hitachi High-Technologies Corp. (Japan) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
468
Page(to):
476
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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