Target noise in overlay metrology

Target noise in overlay metrology

Author(s):

Seligson, J.L. ( KLA-Tencor Corp. (Israel) )
Adel, M.E. ( KLA-Tencor Corp. (Israel) )
Izikson, P. ( KLA-Tencor Corp. (Israel) )
Levinski, V. ( KLA-Tencor Corp. (Israel) )
Yaffe, D. ( KLA-Tencor Corp. (Israel) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5375

Pub. Year:

2004

Page(from):

403

Page(to):

412

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

Language:

English

Call no.:

P63600/5375.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013723
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2004 : 18th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.26

Similar Items:

1 Conference Proceedings Diffraction order control in overlay metrology: a review of the roadmap options M. Adel, D. Kandel, V. Levinski, J. Seligson, A. Kuniavsky Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Characterization of overlay mark fidelity Adel, M., Ghinovker, M.E., Poplawski, J.M., Kassel, E., Izikson, P., Pollentier, I.K., Leray, P., Laidler, D.W. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Overlay metrology simulations: analytical and experimental validations Seligson, J.L., Golovanevsky, B., Poplawski, J.M., Adel, M.E., Silver, R.M. SPIE-The International Society for Optical Engineering	8 Conference Proceedings A comparison of methods for in-chip overlay control at the 65-nm node Robinson, J.C., Stakely, M., Poplawski, J.M., Izikson, P., Kassel, E., Adel, M.E. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Differential signal scatterometry overlay metrology: an accuracy investigation D. Kandel, M. Adel, B. Dinu, B. Golovanevsky, P. Izikson, V. Levinski, I. Vakshtein, P. Leray, M. Vasconi, B. Salski SPIE - The International Society of Optical Engineering	9 Conference Proceedings 45nm design rule in-die overlay metrology on immersion lithography processes Y. Shih, G. K. Huang, C. Yu, M. Adel, C. K. Huang, P. Izikson, E. Kassel, S. Mathur, C. Huang, D. Tien, Y. Avrahamov SPIE - The International Society of Optical Engineering
4 Conference Proceedings Overlay metrology simulations Seligson, J.L., Friedmann, M., Golovanevsky, B., Levinsky, V. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Imaging simulations of optimized overlay marks with deep sUb-resolution features [6152-114] Kandel, D., Adel, M. E., Frommer, A., Levinski, V., Rapoport, A., Silver, R. M. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Overlay accuracy: a metal layer study Habermas, A., Ferguson, B.A., Seligson, J.L., Kassei, E., Izikson, P. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Improved overlay metrology device correlation on 90-nm logic processes Ueno, A., Tsujita, K., Kurita, H., Iwata, Y., Ghinovker, M., Poplawski, J.M., Kassel, E., Adel, M.E. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Overlay accuracy in 0.18-μm copper dual-damascene process Schulz, B., Levinson, H.J., Seltmann, R., Seligson, J.L., Izikson, P., Ronen, A. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Improved overlay control through automated high order compensation S. Wakamoto, Y. Ishii, K. Yasukawa, A. Sukegawa, S. Maejima, A. Kato, J. C. Robinson, B. J. Eichelberger, P. Izikson, M. … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12