Scatterometry feasibility studies for 0.13-micron flash memory lithography applications: enabling integrated metrology
- Author(s):
Lensing, K.R. ( FASL, LLC (USA) ) Miller, C. ( FASL, LLC (USA) ) Chudleigh, G. ( FASL, LLC (USA) ) Swain, B. ( Timbre Technologies, Inc. (USA) ) Laughery, M. ( Timbre Technologies, Inc. (USA) ) Viswanathan, A. ( Tokyo Electron America, Inc. (USA) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 307
- Page(to):
- 316
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.1
- Type:
- Conference Proceedings
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