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Improved overlay metrology device correlation on 90-nm logic processes

Author(s):
Ueno, A. ( Renesas Technology Corp. (Japan) )
Tsujita, K. ( Renesas Technology Corp. (Japan) )
Kurita, H. ( KLA-Tencor Corp. (Japan) )
Iwata, Y. ( KLA-Tencor Corp. (Japan) )
Ghinovker, M. ( KLA-Tencor Corp. (Israel) )
Poplawski, J.M. ( KLA-Tencor Corp. (Israel) )
Kassel, E. ( KLA-Tencor Corp. (Israel) )
Adel, M.E. ( KLA-Tencor Corp. (Israel) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
222
Page(to):
231
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.1
Type:
Conference Proceedings

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