Metrology requirements for lithography's next wave

Metrology requirements for lithography's next wave

Author(s):: Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )
Publication title:: Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5375
Pub. Year:: 2004
Page(from):: 1
Page(to):: 9
Pages:: 9
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819452887 [0819452882]
Language:: English
Call no.:: P63600/5375.1
Type:: Conference Proceedings

Details

TDL ID:	ZA00013723
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2004 : 18th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.23-2004.02.26

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